Recipe Optimization Demo

Automated recipe parameter tuning using reinforcement learning and Bayesian optimization for lithography, etch, and deposition processes

Process Configuration

Ready for Optimization

Process Module

Recipe Type

Target CD (nm)

Optimization Algorithm

Exploration Rate

0.3

Optimization Iterations

50

Optimization Progress

Temperature

-- °C

--

Pressure

-- mTorr

--

Gas Flow

-- sccm

--

RF Power

-- W

--

Process Time

-- sec

--

Achieved CD

-- nm

--