Chemical Mechanical Polishing

Comprehensive modeling and simulation suite for semiconductor planarization processes

100-600
MRR Range (nm/min)
R² > 0.95
ML Prediction Accuracy
1-10 nm
Molecular Scale
300 mm
Wafer Scale

About This Project

This comprehensive suite explores Chemical Mechanical Polishing through interactive simulations, professional tools, and detailed documentation. Covering Preston equation, contact mechanics, tribochemical models, and ML approaches for oxide, copper, and tungsten CMP across molecular to wafer scales.

Interactive Demonstrations (12)

Preston Equation Simulator

Interactive Preston model with pressure/velocity sweeps, material comparison, and MRR prediction

Explore Demo →

Contact Mechanics Model

Greenwood-Williamson asperity contact with pad deformation and pressure distribution

Explore Demo →

Slurry Flow Dynamics

CFD simulation of slurry distribution, particle transport, and concentration profiles

Explore Demo →

Tribochemical Model

Wear-corrosion mechanisms for metal CMP with oxidation kinetics and pH effects

Explore Demo →

Pattern Density Effects

Feature-scale simulation showing step height evolution and dishing/erosion

Explore Demo →

Pad Conditioning Simulator

Pad wear modeling with diamond conditioning and asperity regeneration

Explore Demo →

Temperature & Thermal Effects

Heat generation from friction, slurry temperature, and thermal expansion

Explore Demo →

Abrasive Particle Dynamics

DEM simulation of particle-wafer interactions with indentation mechanics

Explore Demo →

Endpoint Detection

Motor current, optical, and acoustic monitoring for real-time process control

Explore Demo →

Multi-Material Comparison

Side-by-side comparison of oxide, copper, tungsten, and aluminum CMP

Explore Demo →

Wafer-Scale Uniformity

Non-uniformity analysis with center-edge variation and retaining ring effects

Explore Demo →

Molecular Dynamics Simulation

Atomic-scale material removal mechanisms with bond breaking visualization

Explore Demo →

Professional Tools (6)

Process Optimizer

Multi-objective optimization for MRR, uniformity, and selectivity targets

Open Tool →

Recipe Generator

Automated recipe generation from material stack and performance requirements

Open Tool →

Experimental Data Analyzer

Statistical analysis tool for DOE results with Preston coefficient extraction

Open Tool →

ML-Based Predictor

Neural network and physics-informed ML models for MRR prediction

Open Tool →

Cost of Ownership Calculator

Comprehensive CoO analysis including consumables, downtime, and throughput

Open Tool →

Defect Root Cause Analyzer

Diagnostic tool for scratches, dishing, erosion, and particle contamination

Open Tool →

Documentation & Resources (4)

Theory Guide

Comprehensive theory covering Preston, contact mechanics, tribochemistry, and multiscale models

Read Guide →

API Reference

Complete programming interface for CMP models and simulation functions

View API →

Step-by-Step Tutorials

Hands-on tutorials for setting up simulations and analyzing results

Start Learning →

Code Examples

Ready-to-use implementation examples in Python, MATLAB, and JavaScript

Browse Examples →