Film Stress Calculator

Calculate intrinsic and thermal stress in thin films using Stoney equation, predict wafer bowing, analyze multi-layer stacks, and assess cracking risk

Theory & Equations

Stoney Equation

The fundamental equation relating film stress to substrate curvature:

σ = (E_s / (1 - ν_s)) × (t_s² / 6t_f) × (1/R)
where σ = film stress, E_s = substrate Young's modulus, ν_s = substrate Poisson's ratio,
t_s = substrate thickness, t_f = film thickness, R = radius of curvature

Thermal Stress

σ_thermal = (E_f / (1 - ν_f)) × (α_s - α_f) × ΔT
where α = thermal expansion coefficient, ΔT = temperature change

Multi-Layer Stack

1/R = (6 / E_s × t_s²) × Σ(σ_i × t_i)
Sum over all layers i

Stress Types

  • Tensile stress (positive): Film wants to contract, can cause cracking
  • Compressive stress (negative): Film wants to expand, can cause buckling/delamination
  • Intrinsic stress: From growth process (grain boundaries, defects, impurities)
  • Thermal stress: From CTE mismatch during cooling

Substrate Properties

Film Stack Configuration

Thermal Budget

Set to 0 if no annealing

Calculate Stress

Visualizations

Stack Structure

Stress Profile

Wafer Bow (3D)

Thermal Stress vs Temperature

Radius of Curvature

Stress Contributors