DUV Exposure System

193nm ArF and 248nm KrF excimer laser lithography with partial coherence control and source optimization

193 nm
Wavelength (ArF)
25.0 mJ/cm²
Exposure Dose
12%
Exposure Latitude
0.85
Max Intensity

Exposure Parameters

ArF193 nm (ArF)
0.60.93
0.60.85
00.5
1025
60120
3060
-1500

Partial Coherence Imaging Equations

I(x,y) = ∫∫ J(fx,fy) · |P(fx,fy)|² · |M(fx,fy)|² dfx dfy

Exposure Latitude: EL = (Dosemax - Dosemin) / Dosenominal
DOF = k₂·λ/NA² where k₂ ≈ 0.5
Sigma setting: σ = (Source NA) / (Objective NA)

Exposure Intensity Profile

Source Illumination Pattern

Dose-Focus Matrix

CD vs Dose

Process Window

3D Exposure Distribution

Exposure Latitude Analysis