Immersion Lithography Simulator

Water-Based NA Enhancement | Bubble Defects | Leaching & Topcoat Analysis

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Effective NA
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Resolution (nm)
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DOF (nm)
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Bubble Defects
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Leaching Rate (ng/cm²·s)

Immersion Parameters

NA_eff = n_medium × sin(θ) | Resolution: R = k₁λ/(n×NA)
DOF = k₂λ/(n×NA²) | Bubble: P_critical = 2γ/r (Young-Laplace)
Leaching: dm/dt = -k_evap × A × (P_sat - P_ambient)

3D Water Gap Visualization

Resolution vs NA (Immersion vs Dry)
DOF vs NA Comparison
Bubble Defect Map (Wafer)
Bubble Size Distribution
Effective NA Calculation
Topcoat Leaching Rate
Water Temperature Gradient