OPC/RET Optimizer - Interactive OPC Rule Tuning

0.0

Mean EPE (nm)

0.0

Max EPE (nm)

0.0

% Within Spec

SRAF Count

0.000

Model R²

OPC Parameters

Model-based OPC: ΔCD = f(mask_bias, neighbor_density, pattern_orientation)
Edge Placement Error: EPE = |CD_wafer - CD_target|
SRAF Effectiveness: ΔNILS = NILS_with_SRAF - NILS_without_SRAF

Main Feature Bias0 nm

Inside Corner (Hammerhead)15 nm

Outside Corner (Serif)15 nm

Line-End Pullback25 nm

SRAF Width40 nm

SRAF-to-Main Spacing140 nm

OPC Model Aggressiveness1.0

Verification Tolerance±5 nm

3D Visualization

Mask Layout (Before/After OPC)

Aerial Image Intensity Cross-Section

Resist CD vs Mask CD (Calibration)

EPE Distribution

SRAF Effectiveness (NILS Improvement)

Corner Rounding Analysis

Process Window (With/Without OPC)