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Photoresist Chemistry
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Photoresist Chemistry Simulation
PAG diffusion, acid catalysis, dissolution kinetics with Dill ABC parameters
85%
PAG Conversion
15 nm
Acid Diffusion
0.65
Dill A Parameter
120 nm/s
Dev Rate
Chemistry Parameters
PAG Concentration (wt%)
1%
5%
Diffusion Length (nm)
5
15
PEB Temperature (°C)
90
115
PEB Time (s)
30
60
Dill A (absorption)
0.3
0.65
Dill B (bleaching)
0.01
0.05
Dill C (rate)
0.001
0.008
Developer Conc (N)
0.15
0.26
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Dill Model: I(z,t) = I₀·exp(-∫A(z',t)dz')
A(z,t) = A + B·M(z,t), dM/dt = -C·I(z,t)·M(z,t)
Acid Diffusion: ∂[H⁺]/∂t = D·∇²[H⁺] + k·[PAG*]
Development Rate: R = Rmax·(1-exp(-k·[H⁺]))
Resist Profile Evolution
PAG Conversion vs Depth
Acid Concentration
Development Rate
Absorption vs Time
3D Resist Surface
Contrast Curve