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Process Window Calculator
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Process Window Calculator
DOF, Exposure Latitude, MEF, ILS, NILS & Common Process Window Analysis
0
DOF (nm)
0.0
EL (%)
0.00
MEF
0.000
ILS (nm⁻¹)
0.00
NILS
0
CPW Area (µm²)
Lithography Parameters
DOF = k₂ × λ / NA² | EL% = (E_max - E_min) / E_nom × 100
MEF = ∂CD_wafer / ∂CD_mask | NILS = (pitch/λ) × (1/I_th) × |dI/dx|_max
ILS = λ / (pitch × NILS)
Nominal CD
60
nm
CD Tolerance
±6
nm
Wavelength λ
193
nm
Numerical Aperture (NA)
0.40
Illumination σ
0.60
Resist Contrast γ
9
k₁ Factor
0.35
k₂ Factor
0.60
3D Process Window Volume
Bossung Curves (CD vs Focus)
Process Window Map (Focus × Exposure)
DOF vs NA (Parametric Sweep)
Exposure Latitude vs CD Tolerance
MEF vs Pitch (Mask Linearity)
NILS vs Illumination Settings
Common Process Window (Overlay)