Mask Pattern Generation
Generate and visualize semiconductor mask patterns in real-time. Adjust parameters to see immediate results.
45
Critical Dimension (nm)
96.5
CD Uniformity (%)
52.3
Pattern Density (%)
Optical Proximity Correction
Apply OPC corrections to improve pattern fidelity. Compare before and after results.
1.8
EPE RMS (nm)
97.2
Pattern Fidelity (%)
5
Iterations
Defect Inspection & Analysis
Detect and classify defects using advanced algorithms. Analyze size distribution and spatial patterns.
12
Total Defects
0.08
Density (/cm²)
94.5
Predicted Yield (%)
Fourier Optics Simulation
Simulate optical imaging using Fourier optics. Calculate MTF, PSF, and aerial images.
35
Resolution (nm)
±100
Depth of Focus (nm)
0.85
Image Contrast
Monte Carlo Process Simulation
Statistical modeling of process variations. Analyze CD distribution, overlay, and yield.
1.67
Process Cpk
2.1
CD 3σ (nm)
96.8
Predicted Yield (%)
Integrated Workflow Simulation
Complete mask-to-wafer simulation pipeline. All modules working together.
2.3
Process Time (s)
6
Pipeline Steps
95.2
Final Yield (%)