Etching Recipe Optimizer

Multi-objective optimization using Particle Swarm Optimization (PSO) algorithm. Simultaneously optimize etch rate, uniformity, selectivity, and minimize plasma damage while respecting process constraints. Visualize Pareto fronts, sensitivity analysis, and convergence behavior.

How to Use This Tool

Set target specifications for etch rate, uniformity, selectivity, and damage control
Adjust optimization priorities (weights) for each objective - higher weight = more important
Define process constraints (pressure, power, gas flow limits)
Configure PSO algorithm parameters (particles, iterations)
Click "Run Optimization" to find optimal recipes using particle swarm intelligence
Analyze Pareto front to see trade-offs between objectives
Review sensitivity analysis to understand parameter impact
Export optimal recipe as JSON for implementation

Optimization Parameters

Configure target specifications and priorities for multi-objective optimization.

Target Specifications

Target Etch Rate (nm/min) Desired material removal rate

Target Uniformity (%) 3-sigma uniformity across wafer (lower is better)

Target Selectivity Etch selectivity to mask/stop layer

Max Acceptable Damage (a.u.) Plasma-induced damage metric (lower is better)

Optimization Priorities

Etch Rate Priority Weight Current: 7.0

Uniformity Priority Weight Current: 9.0

Selectivity Priority Weight Current: 8.0

Damage Control Priority Weight Current: 6.0

Process Constraints

Pressure Range (mTorr)

RF Power Range (W)

Gas Flow Range (sccm)

PSO Algorithm Settings

Number of Particles Swarm size (more = better coverage, slower)

Number of Iterations Optimization cycles

Running PSO optimization...

Pareto Front - Multi-Objective Trade-offs

Pressure Sensitivity Analysis

Power Sensitivity Analysis

Gas Flow Sensitivity Analysis

Optimization Convergence History

Constraint Utilization

Parameter Space Exploration

Optimization Results

Optimization Complete! Found optimal recipe balancing all objectives.

Optimized Etch Rate

- nm/min

Achieved Uniformity

Achieved Selectivity

-:1

Damage Metric

- a.u.